Atomic-layer adsorption of P on Si(100) and Ge(100) by PH3 using an ultraclean low-pressure chemical vapor deposition - Concepedia

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Atomic-layer adsorption of P on Si(100) and Ge(100) by PH3 using an ultraclean low-pressure chemical vapor deposition

28

Citations

9

References

2000

Year

Yosuke Shimamune, Masao Sakuraba, Takashi Matsuura, Junichi Murota

Applied Surface Science

Chemical EngineeringEngineeringNanotechnologySurface ScienceApplied PhysicsChemisorptionAtomic-layer AdsorptionChemistryChemical DepositionSilicon On InsulatorAdsorptionChemical Vapor Deposition

References

	Year	Citations

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