Kyong Taek Lee - Concepedia

Author

Kyong Taek Lee

Samsung (South Korea)

Also Known As

Kyong Taek Lee

Publications

234

Citations

H-Index

Concepts

All Affiliations

Samsung (South Korea)Pohang University of Science and Technology Chungnam National University The University of Texas at Austin

About

Kyong Taek Lee is an author at Samsung (South Korea) specializing in electrical engineering, microelectronics, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	212
2	Electrical Engineering	8	8	212
3	Applied Physics	6	6	186
4	Computer Engineering	2	2	55
5	Materials Engineering	2	2	72

Kyong Taek Lee

Publications

212

Citations

H-Index

Page 1

	Year	Citations
Technology scaling on High-K &amp; Metal-Gate FinFET BTI reliability Kyong Taek Lee, Wonchang Kang, Eun-Ae Chung, Materials EngineeringElectrical EngineeringEngineeringVlsi DesignTechnology Scaling	2013	56
PBTI-Associated High-Temperature Hot Carrier Degradation of nMOSFETs With Metal-Gate/High- $k$ Dielectrics Kyong Taek Lee, Chang Yong Kang, Ook Sang Yoo, IEEE Electron Device Letters Semiconductor TechnologyElectrical EngineeringHc StressEngineeringNanoelectronics	2008	43
Frequency dependent TDDB behaviors and its reliability qualification in 32nm high-k/metal gate CMOSFETs Kyong Taek Lee, Jongik Nam, Minjung Jin, Electrical EngineeringHigh-k/metal Gate CmosfetsEngineeringVlsi DesignHardware Reliability	2011	37
New observations on hot carrier induced dynamic variation in nano-scaled SiON/poly, HK/MG and FinFET devices based on on-the-fly HCI technique: The role of single trap induced degradation Changze Liu, Kyong Taek Lee, Sangwoo Pae, EngineeringSingle TrapSilicon On InsulatorSemiconductor DeviceNano-scaled Sion/poly	2014	20
New observations on the random telegraph noise induced Vth variation in nano-scale MOSFETs Changze Liu, Kyong Taek Lee, Hyun-Woo Lee, Device ModelingElectrical EngineeringSemiconductor DeviceEngineeringNanoelectronics	2014	18
A Study of Strain Engineering Using CESL Stressor on Reliability Comparing Effect of Intrinsic Mechanical Stress Kyong Taek Lee, Chang Yong Kang, Min Sang Park, IEEE Electron Device Letters EngineeringMechanical EngineeringReliability CharacteristicsResidual StressReliability Comparing Effect	2009	16
Interfacial-Layer-Driven Dielectric Degradation and Breakdown of HfSiON/SiON Gate Dielectric nMOSFETs Do-Young Choi, Kyong Taek Lee, Chang‐Ki Baek, IEEE Electron Device Letters Electrical EngineeringSemiconductor DeviceEngineeringCrystalline DefectsStress-induced Leakage Current	2011	12
A comparative study of reliability and performance of strain engineering using CESL stressor and mechanical strain Kyong Taek Lee, Chang Yong Kang, Ook Sang Yoo, EngineeringMechanical EngineeringReliability CharacteristicsResidual StressStructural Engineering	2008	10

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