Statistics
Publications
1
Citations
21
H-Index
1
Active since
2005
Affiliations
Osaka Institute of Technology(Current)
H. Niu is an author at Osaka Institute of Technology specializing in microfabrication, instrumentation, and synchrotron radiation.
Publications per year
2005–2005
1
1
Dependence of linewidth and its edge roughness on electron beam exposure dose
M. Kotera, Kei Yagura, H. Niu · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 21 citations
Engineering, Electron-beam Lithography, Electron Diffraction +17
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