V. Golovkina

Statistics

Publications

Citations

381

H-Index

Active since

1992

Affiliations

University of Wisconsin–Madison(Current)

University of North Carolina at Charlotte

Paul Scherrer Institute

Lomonosov Moscow State University

V. Golovkina is an author at University of Wisconsin–Madison specializing in materials science, thin film lithography, and extreme ultraviolet lithography.

Publications per year

1992–2004

Publications

Sub-50 nm period patterns with EUV interference lithography

H. H. Solak, C. David, J. Gobrecht et al. · Microelectronic Engineering · 2003 · 195 citations

Natural Sciences, Electrical Engineering, Materials Science +11

Optical second-harmonic generation induced by a dc electric field at the Si–SiO_2 interface

O.A. Aktsipetrov, Andrey A. Fedyanin, V. Golovkina et al. · Optics Letters · 1994 · 85 citations

Engineering, Materials Engineering, Materials Science +17

Anderson localization effects in the second harmonic generation at a weakly rough metal surface

O. A. Aktsipetrov, V. Golovkina, Ondrej Kapusta et al. · Physics Letters A · 1992 · 27 citations

Natural Sciences, Materials Science, Physics +15

Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

V. Golovkina, Paul F. Nealey, F. Cerrina et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 24 citations · Full text

Engineering, Electrical Engineering, Materials Science +13

High performance resist for EUV lithography

Kenneth E. Gonsalves, Muthiah Thiyagarajan, Jae‐Hak Choi et al. · Microelectronic Engineering · 2004 · 23 citations

Engineering, Electrical Engineering, Materials Science +9

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