E. Scheid

Residual stress in low pressure chemical vapor deposition SiNx films deposited from silane and ammonia

P. Temple‐Boyer, Carole Rossi, E. Saint-Etienne et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 169 citations

Materials Engineering, Materials Science, Optical Materials +13

Optical and structural properties of SiOx and SiNx materials

E. Dehan, P. Temple‐Boyer, Redhouane Henda et al. · Thin Solid Films · 1995 · 87 citations

Materials Science, Materials Engineering, Optical Materials +7

Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si

Georgios P. Gakis, Constantin Vahlas, Hugues Vergnes et al. · Applied Surface Science · 2019 · 83 citations · Full text

Materials Engineering, Materials Science, Aluminium Nitride +10

Selective epitaxial silicon growth in the 650–1100 °C range in a reduced pressure chemical vapor deposition reactor using dichlorosilane

J.L. Regolini, D. Bensahel, E. Scheid et al. · Applied Physics Letters · 1989 · 63 citations

Materials Engineering, Chemical Engineering, Epitaxial Growth +15

Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water

Georgios P. Gakis, Hugues Vergnes, E. Scheid et al. · Chemical Engineering Science · 2018 · 57 citations · Full text

Materials Science, Aluminium Nitride, Surface Characterization +10