Xumou Xu

Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm

Yijian Chen, Ping Xu, Liyan Miao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 27 citations

Engineering, Computer Engineering, Digital Fabrication +16

Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond

Xiangqun Miao, Lior Huli, Hao Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 12 citations

Engineering, Electrical Engineering, Materials Science +9

Implementing self-aligned double patterning on non-gridded design layouts

Huixiong Dai, Jason Sweis, Chris Bencher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 11 citations

Engineering, Computer Engineering, Computer-aided Design +16

Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning

Shiyu Sun, Chris Bencher, Yong Mei Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 11 citations

Engineering, Computer Engineering, Electrical Engineering +11