Ulrich Klostermann

Field programmable spin-logic based on magnetic tunnelling elements

Ralf P. Richter, H. Boeve, L. Bär et al. · Journal of Magnetism and Magnetic Materials · 2002 · 38 citations

Magnetism, Spintronics, Engineering +8

Calibration and verification of a stochastic model for EUV resist

Weimin Gao, Alexander Philippou, Ulrich Klostermann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 30 citations

Engineering, Electron-beam Lithography, Measurement +19

A Perpendicular Spin Torque Switching based MRAM for the 28 nm Technology Node

Ulrich Klostermann, M. Angerbauer, U. Grüning et al. · 2007 · 27 citations

Critical Programming Currents, Spintronics, Electrical Engineering +14

Application of an inverse Mack model for negative tone development simulation

Weimin Gao, Ulrich Klostermann, Thomas Mülders et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 17 citations

Aeroacoustics, Audio Electroacoustics, Engineering +21

Role of 3D photo-resist simulation for advanced technology nodes

Aravind Narayana Samy, Rolf Seltmann, Frank Kahlenberg et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 14 citations

Engineering, Resist Model Portability, Electron-beam Lithography +21