Rainer Pforr

Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Christoph M. Friedrich, Leonhard Mader, Andreas Erdmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 12 citations

Geometric Modeling, Engineering, Electron-beam Lithography +15

<title>Feature biasing versus feature-assisted lithography: a comparison of proximity correction methods for 0.5*(lambda/NA) lithography</title>

Rainer Pforr, Kurt Ronse, Luc Van den hove et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 12 citations

Engineering, Electron-beam Lithography, Optic Design +17

Performance comparison of techniques for intra-field CD control improvement

Rainer Pforr, Mario Hennig, Jens Reichelt et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 11 citations

Physical Design (Electronics), Engineering, Calibration +14