K.N. Kim

High rate sapphire (Al2O3) etching in inductively coupled plasmas using axial external magnetic field

D.W. Kim, Chaiho Jeong, K.N. Kim et al. · Thin Solid Films · 2003 · 37 citations

Materials Science, Magnetism, Engineering +7

Characteristics of SiO2 etching by using pulse-time modulation in 60 MHz/2 MHz dual-frequency capacitive coupled plasma

Minjeong Jeon, AC Mishra, Sanghyun Kang et al. · Current Applied Physics · 2013 · 18 citations

Electrical Engineering, Engineering, Microfabrication +8

Linear internal inductively coupled plasma (ICP) source with magnetic fields for large area processing

Y.J. Lee, K.N. Kim, Byung-Pan Song et al. · Thin Solid Films · 2003 · 15 citations

Electrical Engineering, Engineering, Magnetic Confinement +4

Effects of multipolar magnetic fields on the characteristics of plasma and photoresist etching in an internal linear inductively coupled plasma system

K.N. Kim, Y.J. Lee, S.J. Kyong et al. · Surface and Coatings Technology · 2004 · 10 citations

Magnetism, Electrical Engineering, Engineering +7