High rate sapphire (Al2O3) etching in inductively coupled plasmas using axial external magnetic field - Concepedia

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High rate sapphire (Al2O3) etching in inductively coupled plasmas using axial external magnetic field

37

Citations

11

References

2003

Year

D.W. Kim, Chaiho Jeong, K.N. Kim, Hyoyoung Lee, H.S. Kim, Youngje Sung, G.Y. Yeom

Thin Solid Films

Materials ScienceMagnetismEngineeringApplied PhysicsHigh Rate SapphireMagnetohydrodynamicsGas Discharge PlasmaPlasma ApplicationPlasma EtchingPlasma Processing

References

	Year	Citations

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