Statistics
Publications
3
Citations
33
H-Index
3
Active since
2005
Affiliations
Louis Markoya is an author at Carl Zeiss (Germany) specializing in applied physics, 3d printing, and microfabrication.
Publications per year
2005–2007
3
3
32nm node technology development using interference immersion lithography
Harry Sewell, Diane McCafferty, Louis Markoya et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 12 citations
Engineering, Water-based Immersion Lithography, Electron-beam Lithography +16
Extending immersion lithography with high-index materials: results of a feasibility study
Harry Sewell, Jan Mulkens, Paul Graeupner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 10 citations
Optical Materials, Engineering, Electron-beam Lithography +28
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