M. Sanchez

Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance

William D. Hinsberg, Frances A. Houle, John A. Hoffnagle et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 163 citations

High Resolution, Engineering, Electron-beam Lithography +16

Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists

William D. Hinsberg, Frances A. Houle, M. Sanchez et al. · IBM Journal of Research and Development · 2001 · 122 citations

Engineering, Electron-beam Lithography, Microscopy +21

Modeling line edge roughness effects in sub 100 nanometer gate length devices

P. Oldiges, Qimghuamg Lin, Karen Petrillo et al. · 2002 · 112 citations

Device Modeling, Electrical Engineering, Semiconductor Device +13

Polyimides derived from nonaromatic monomers: synthesis, characterization and potential applications

Willi Volksen, H.J. Cha, M. Sanchez et al. · Reactive and Functional Polymers · 1996 · 99 citations

Synthetic Macromolecule, Polymer Reaction, Macromolecular Chemistry +8

Liquid immersion deep-ultraviolet interferometric lithography

John A. Hoffnagle, William D. Hinsberg, M. Sanchez et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 94 citations

Photonics, Engineering, Electron-beam Lithography +13