M. Sanchez

Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance

William D. Hinsberg, Frances A. Houle, John A. Hoffnagle et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 163 citations

Natural Sciences, Materials Science, Contrast Sensitivity +12

Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists

William D. Hinsberg, Frances A. Houle, M. Sanchez et al. · IBM Journal of Research and Development · 2001 · 123 citations

Engineering, Materials Engineering, Materials Science +10

Modeling line edge roughness effects in sub 100 nanometer gate length devices

P. Oldiges, Qimghuamg Lin, Karen Petrillo et al. · 2002 · 112 citations

Engineering, Electrical Engineering, Materials Science +17

Polyimides derived from nonaromatic monomers: synthesis, characterization and potential applications

Willi Volksen, H.J. Cha, M. Sanchez et al. · Reactive and Functional Polymers · 1996 · 101 citations

Natural Sciences, Materials Engineering, Materials Science +14

Liquid immersion deep-ultraviolet interferometric lithography

John A. Hoffnagle, William D. Hinsberg, M. Sanchez et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 95 citations

Natural Sciences, Materials Science, Optical Materials +16