Kab-Jin Nam

Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors

Suraj Cheema, Nirmaan Shanker, Li‐Chen Wang et al. · Nature · 2022 · 320 citations · Full text

Oxide Heterostructures, Electrical Engineering, Engineering +5

Hot carrier reliability characterization in consideration of self-heating in FinFET technology

Minjung Jin, Changze Liu, Jinju Kim et al. · 2016 · 71 citations

Engineering, Finfet Technology, Semiconductor Device +18

Negative differential capacitance in ultrathin ferroelectric hafnia

Sanghyun Jo, Hyangsook Lee, Duk‐Hyun Choe et al. · Nature Electronics · 2023 · 57 citations

Electrical Engineering, Engineering, Ferroelectric Application +4

True 7nm Platform Technology featuring Smallest FinFET and Smallest SRAM cell by EUV, Special Constructs and 3^rd Generation Single Diffusion Break

Wonbeen Jeong, Do Hyun Kwon, Kab-Jin Nam et al. · 2018 · 50 citations

Engineering, Vlsi Design, Emerging Memory Technology +19

A practical Si nanowire technology with nanowire-on-insulator structure for beyond 10nm logic technologies

Sung-Gi Hur, Jung-Gil Yang, Sang-Su Kim et al. · 2013 · 47 citations

Engineering, Nanodevices, Integrated Circuits +17