Wolfgang Demmerle

Applying stochastic simulation to study defect formation in EUV photoresists

Lawrence S. Melvin, Ulrich Welling, Yudhishthir Kandel et al. · Japanese Journal of Applied Physics · 2022 · 19 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Application of an inverse Mack model for negative tone development simulation

Weimin Gao, Ulrich Klostermann, Thomas Mülders et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 17 citations

Engineering, Manufacturing Engineering, Materials Engineering +12

Impact of realistic source shape and flexibility on source mask optimization

Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 13 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +15

Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Weimin Gao, Ulrich Klostermann, Itaru Kamohara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 10 citations

Engineering, Materials Science, 3D Modeling +14