Concepedia

W. F. A. Besling

WF

14

Publications

602

Citations

11

H-Index

1998

Active since

Affiliations

Philips (Netherlands)(Current)

NXP (Netherlands)

Eindhoven University of Technology

Philips (Finland)

Philips (Belgium)

W. F. A. Besling is an author at Philips (Netherlands) specializing in applied physics, surface science, and engineering.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceThin FilmsElectrical EngineeringNanotechnologyElectrical InsulationPhysicsMicroelectronics

Publications per year

1998–2010

14

Publications

14

Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films

W. F. A. Besling, A. Goossens, Ben Meester et al. · Journal of Applied Physics · 1998 · 122 citations

Optical Materials, Engineering, Laser Applications +19

Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2

A. Satta, Jörg Schuhmacher, Caroline M. Whelan et al. · Journal of Applied Physics · 2002 · 90 citations

Film Thickness Control, Engineering, Thin Film Process Technology +16

Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films

K. B. Jinesh, J. Leo van Hemmen, M. C. M. van de Sanden et al. · Journal of The Electrochemical Society · 2010 · 77 citations · Full text

Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications

Dirk-Jan Hoogeland, K. B. Jinesh, F. Roozeboom et al. · Journal of Applied Physics · 2009 · 52 citations · Full text

Materials Science, Materials Engineering, Electrical Engineering +15

Continuous deep reactive ion etching of tapered via holes for three-dimensional integration

R Li, Yann Lamy, W. F. A. Besling et al. · Journal of Micromechanics and Microengineering · 2008 · 51 citations · Full text

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