J. F. Kirchhoff

SiO 2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry

David A. Cole, Jeffrey R. Shallenberger, Steven W. Novak et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 96 citations

Natural Sciences, Materials Engineering, Materials Science +17

Photoconductivity parameters in lithium niobate

Robert Gerson, J. F. Kirchhoff, L. E. Halliburton et al. · Journal of Applied Physics · 1986 · 61 citations

Natural Sciences, Materials Science, Physics +13

Oxide thickness determination by XPS, AES, SIMS, RBS and TEM

Jeffrey R. Shallenberger, David A. Cole, Steven W. Novak et al. · 2003 · 20 citations

Natural Sciences, Materials Engineering, Materials Science +13

Impurity determination in electronic materials by accelerator mass spectrometry

Floyd D. McDaniel, J. Anthony, J. F. Kirchhoff et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1994 · 20 citations

Natural Sciences, Chemistry, Materials Science +16

Model of the contamination effect in ion-induced electron emission

A.M. Arrale, Zhiyong Zhao, J. F. Kirchhoff et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1994 · 15 citations

Engineering, Nuclear Engineering, Plasma Physics +10