Toshio Shiraiwa

Theoretical Calculation of Fluorescent X-Ray Intensities in Fluorescent X-Ray Spectrochemical Analysis.

Toshio Shiraiwa, Nobukatsu Fujino · Japanese Journal of Applied Physics · 1966 · 435 citations

X-ray Spectroscopy, Engineering, Chemistry +16

A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon Wafer

Masataka Hourai, Toshio Naridomi, Yasunori Oka et al. · Japanese Journal of Applied Physics · 1988 · 113 citations

Engineering, Metallic Impurity, Silicon On Insulator +17

The Theory of the Fine Structure of the X-ray Absorption Spectrum

Toshio Shiraiwa, Tsutomu Ishimura, Masao Sawada · Journal of the Physical Society of Japan · 1958 · 61 citations

X-ray Spectroscopy, Engineering, Physics +15

Behavior of Defects Induced by Metallic Impurities on Si(100) Surfaces

Masataka Hourai, Katsumi Murakami, Tatsuhiko Shigematsu et al. · Japanese Journal of Applied Physics · 1989 · 57 citations

Magnetic Properties, Engineering, Silicon On Insulator +18

Theoretical Calculation of Fluorescent X-Ray Intensities of Nickel-Iron-Chromium Ternary Alloys

Toshio Shiraiwa, Nobukatsu Fujino · Bulletin of the Chemical Society of Japan · 1967 · 54 citations

Materials Science, Materials Engineering, X-ray Spectroscopy +14