G. Congedo

Effects of Thermal Treatments on the Trapping Properties of HfO$_{2}$ Films for Charge Trap Memories

Sabina Spiga, F. Driussi, Alessio Lamperti et al. · Applied Physics Express · 2012 · 57 citations

Cubic/Tetragonal Phase Stabilization in High-κ ZrO2 Thin Films Grown Using O3-Based Atomic Layer Deposition

Alessio Lamperti, L. Lamagna, G. Congedo et al. · Journal of The Electrochemical Society · 2011 · 43 citations

Materials Science, Oxide Heterostructures, Engineering +15

Dielectric properties of Er−doped HfO2 (Er∼15%) grown by atomic layer deposition for high-κ gate stacks

Claudia Wiemer, L. Lamagna, S. Baldovino et al. · Applied Physics Letters · 2010 · 39 citations · Full text

Materials Science, Oxide Heterostructures, Electrical Engineering +15

Pulsed plasma ion source to create Si nanocrystals in SiO2 substrates

A. Lorusso, V. Nassisi, G. Congedo et al. · Applied Surface Science · 2008 · 33 citations

Materials Science, Ion Implantation, Engineering +9

Stack engineering of TANOS charge-trap flash memory cell using high-κ ZrO2 grown by ALD as charge trapping layer

G. Congedo, Alessio Lamperti, L. Lamagna et al. · Microelectronic Engineering · 2011 · 25 citations

Materials Science, Electrical Engineering, Engineering +11