Concepedia

F. Neppl

FN

7

Publications

118

Citations

7

H-Index

1979

Active since

Affiliations

Siemens (Germany)(Current)

F. Neppl is an author at Siemens (Germany) specializing in applied physics, engineering, and microelectronics.

Top concepts

EngineeringApplied PhysicsMicroelectronicsElectrical EngineeringMaterial SciencePhysicsThin FilmsSurface ScienceMaterials EngineeringNanoelectronics

Publications per year

1979–1984

7

Publications

7

Mechanism of intersubband resonant photoresponse

F. Neppl, J. P. Kotthaus, J. F. Koch · Physical review. B, Condensed matter · 1979 · 43 citations

Engineering, Intersubband Resonance, Semiconductor Device +16

Properties of evaporated and sputtered TaSi<sub>2</sub>films and the influence of the residual gas composition

F. Neppl, Ulrich Schwabe · IEEE Transactions on Electron Devices · 1982 · 18 citations

Materials Science, Materials Engineering, Thin Film Physics +15

Properties of Mo‐Silicides in Si‐Gate Technology

F. Neppl, G. Menzel, Ulrich Schwabe · Journal of The Electrochemical Society · 1983 · 15 citations

Materials Science, Electrical Engineering, Engineering +13

Sputtered Ti-Doped Al-Si for Enhanced Interconnect Reliability

Fabian Fischer, F. Neppl · Reliability physics · 1984 · 12 citations

Aluminium Nitride, Engineering, Ti-doped Al-si +17

Influence of slight deviations from TaSi2 stoichiometry on the high-temperature stability of tantalum silicide/silicon contacts

H. Oppolzer, F. Neppl, K. Hieber et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1984 · 10 citations

Tasi2 Stoichiometry, Engineering, Integrated Circuits +19

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