Yuji Kasashima - Concepedia

Author

Yuji Kasashima

National Institute of Advanced Industrial Science and Technology ORCID

Also Known As

Y Kasashima, Y. Kasashima, Yuji KASASHIMA, Yuji Kasashima

Publications

254

Citations

H-Index

Concepts

All Affiliations

National Institute of Advanced Industrial Science and Technology Tohoku University Advantest (Japan)

About

Yuji Kasashima is an author at National Institute of Advanced Industrial Science and Technology specializing in engineering, microfabrication, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	165
2	Electrical Engineering	5	5	75
3	Applied Physics	4	4	89
4	Education	1	1	11
5	Computer Engineering	1	1	11

Yuji Kasashima

Publications

175

Citations

H-Index

Page 1

	Year	Citations
Instantaneous Generation of Many Flaked Particles by Impulsive Force of Electric Field Stress Acting on Inner Wall of Mass-Production Plasma Etching Equipment Yuji Kasashima, Natsuko Nabeoka, Fumihiko Uesugi Japanese Journal of Applied Physics Instantaneous GenerationEngineeringPhysicsMicrofabricationSurface Science	2013	32
Many flaked particles caused by impulsive force of electric field stress and effect of electrostriction stress in mass-production plasma etching equipment Yuji Kasashima, Natsuko Nabeoka, Taisei Motomura, Japanese Journal of Applied Physics Electrical EngineeringInstantaneous GenerationEngineeringPhysicsMicrofabrication	2014	23
Investigation of the relationship between plasma etching characteristics and microstructures of alumina ceramics for chamber parts Yuji Kasashima, Tatsuo Tabaru, Osamu Matsuda, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringEngineeringCeramicsMicrofabrication	2019	21
Transport of a helicon plasma by a convergent magnetic field for high speed and compact plasma etching Kazunori Takahashi, Taisei Motomura, Akira Ando, Journal of Physics D Applied Physics EngineeringPlasma SciencePlasma PhysicsPermanent MagnetPlasma Processing	2014	19
Generation of supersonic plasma flows using an applied-field MPD arcjet and ICRF heating M. Inutake, Akira Ando, Katsumi Hattori, Plasma Physics and Controlled Fusion AeroacousticsEngineeringFluid MechanicsSupersonic PlasmaPlasma Science	2007	18
Numerous flaked particles instantaneously generated by micro-arc discharge in mass-production plasma etching equipment Yuji Kasashima, Taisei Motomura, Natsuko Nabeoka, Japanese Journal of Applied Physics Electrical EngineeringInstantaneous GenerationEngineeringMicrofabricationGlow Discharge	2014	15
Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system Yuji Kasashima, Hiroyuki Kurita, Naoya Kimura, Japanese Journal of Applied Physics Electrical EngineeringInner Wall ConditionEngineeringMass-production PlasmaStructural Health Monitoring	2015	13
Detection of Micro-Arc Discharge Using ESC Wafer Stage With Built-In AE Sensor Yuji Kasashima, Tatsuo Tabaru, Yoshikazu Kobayashi, IEEE Transactions on Semiconductor Manufacturing Electrical EngineeringElectronic InstrumentationEngineeringHigh SensitivityMicrofabrication	2013	13
Note: Practical monitoring system using characteristic impedance measurement during plasma processing Taisei Motomura, Yuji Kasashima, O. Fukuda, Review of Scientific Instruments Real-time MonitoringEngineeringAnomaly DetectionMeasurementEducation	2014	11
Impulsive force phenomenon of electric field stress causing serious particle contamination in plasma etching equipment Yuji Kasashima, Fumihiko Uesugi Japanese Journal of Applied Physics	2014	10

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