Journal of Materials Chemistry A · 2024 · 35 citations · 51 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsPerovskite MaterialsRadiation Damage In MaterialsSemiconductor Thin FilmsSolar CellsThin-film DepositionTransparent Conducting OxidesPassivation LayersPerovskite Oxide SemiconductorsPerovskite Solar CellsSputter DepositionSputteringSputtering ProcessesTransparent Conductive FilmsTransparent Conductive Oxides
The origin of sputter damage during transparent conductive oxide deposition is ion bombardment rather than plasma radiation. Ion bombardment increased recombination, whereas plasma radiation reduced recombination.
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X-ray line broadening from filed aluminium and wolfram
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