Rapid thermal oxidation of nano silver film for solar cell fabrication

Abstract

In this paper, the nano Silver dioxides films have been deposited using the reactive pulsed laser deposition method (RPLD) using the tattoo removal Q-swithing Nd-Yag laser, at the value of the wavelength of 1064nm, pulseduration of 6 sec, and 800 mJ energy of laser have been applied for ablated an extra purity of the Silver target then deposited the nano siver oxide particles on the silicon substrates, synthesize and studying of the rapid thermal annealing (RTA) effects on the structural properties, the morphological properties, the Optical properties, the electrical properties and finally the solar cell properties for the prepared samples. Both X-ray diffraction and electron microscopy studies show that the structure of the film depends on the annealing teamperatures effects of the deposited film. The nano silver oxide is present in different crystalline stages, where the particle sizes have been increases with increasing heat treatment from 45nm to 75 nm. The analized Results of the optical aprove the improvements of the absorption lead to decreasing the reflection values compared with the surface of the silicon (crystalline Si), where the transparency for the range of larger than 300 nm and the values of the optical band gap of 2.12 eV. The synthesized results for the solar cell fabrications present a clear improvement in the solar cell quantum efficiency values in the case of silver nano oxide deposition and annealed with the high degree, where the value of the efficiency about of 4.22.