Effect of the carboxyl group number of the complexing agent on polishing performance of alumina slurry in sapphire CMP

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

Hideo Aida, Toshiro Doi, Hidetoshi Takeda et al. · Current Applied Physics · 2012 · 257 citations

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A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry

Zhenyu Zhang, Zhifeng Shi, Yuefeng Du et al. · Applied Surface Science · 2017 · 240 citations

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Influence of the dispersant structure on properties of electrostatically stabilized aqueous alumina suspensions

Pirmin C. Hidber, Thomas Graule, Ludwig J. Gauckler · Journal of the European Ceramic Society · 1997 · 217 citations

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Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy

Zhenyu Zhang, Longxing Liao, Xinze Wang et al. · Applied Surface Science · 2019 · 206 citations

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Green chemical mechanical polishing of sapphire wafers using a novel slurry

Wenxiang Xie, Zhenyu Zhang, Longxing Liao et al. · Nanoscale · 2020 · 200 citations

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