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Ultrathin InGaO Thin Film Transistors by Atomic Layer Deposition
61
Citations
31
References
2022
Year
SemiconductorsSemiconductor TechnologyElectrical EngineeringIgo TftsEngineeringElectronic MaterialsApplied PhysicsUltrathin ThicknessSemiconductor MaterialSemiconductor Device FabricationThin FilmsMolecular Beam EpitaxyMicroelectronicsAtomic Layer DepositionSemiconductor Device
In this letter, we report on scaled ultrathin (~3 nm) InGaO (IGO) thin film transistors (TFTs) by atomic layer deposition (ALD) under a low thermal budget of 250 °C. The ALD-derived IGO channels are In-rich, with In/Ga atomic ratio of ~86:14, providing a high electron mobility of ~28.6 cm <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{{2}} \cdot \text{V}^{-{1}}\,\,\cdot \text{s}^{-{1}}$ </tex-math></inline-formula> under a ultrathin thickness of 3 nm. The resulting IGO TFTs exhibit excellent scaling behaviors down to sub-100 nm channel length ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{L}_{\text {ch}}$ </tex-math></inline-formula> ). The IGO TFTs with a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{L}_{\text {ch}}$ </tex-math></inline-formula> of 80 nm show well-behaved electrical characteristics including a high on/off current ratio ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{I}_{\text {on}}/\text{I}_{\text {off}}$ </tex-math></inline-formula> ) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${1.8}\times {10} ^{{10}}$ </tex-math></inline-formula> , a low subthreshold swing (SS) of 92 mV/dec under <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{V}_{\text {DS}}$ </tex-math></inline-formula> of 0.8 V. The negative- and positive-gate-bias-stress stability (NBS and PBS) of IGO TFTs are studied in both <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{N}_{{2}}$ </tex-math></inline-formula> and air ambient, where a remarkably high PBS stability can be observed. The negative <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{V}_{\text {th}}$ </tex-math></inline-formula> shifts during PBS and NBS test in <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{N}_{{2}}$ </tex-math></inline-formula> ambient could be explained by the generation of donor-like traps originating from ionized oxygen vacancy, in addition to electron (de)trapping mechanism. This work presents the first demonstration of high-performance IGO TFTs with a miniatured device dimension, showing the potential for back-end-of-line (BEOL)-compatible monolithic 3D integration.
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