Concepedia

Investigation of emission lines for in-situ elemental analysis of Cu–Zn films deposited by sputtering

Susumu Imashuku, Haruka Narita, Kazuaki Wagatsuma

Spectrochimica Acta Part B Atomic Spectroscopy · 2022 · 13 citations · 8 references

DOI

Concepts

References

8

Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev

N. Laegreid, G. K. Wehner · Journal of Applied Physics · 1961 · 807 citations

, , +13

Physics and technology of magnetron sputtering discharges

Plasma Sources Science and Technology · 2020 · 502 citations · Full text

, , +13

Plasma-emission-controlled d.c. magnetron sputtering of TiO2-x thin films

A. Brudnik, H. Czternastek, K. Zakrzewska et al. · Thin Solid Films · 1991 · 69 citations

, , +12

Vacuum technology, thin films and sputtering: An introduction

J.S. Colligon · Vacuum · 1984 · 37 citations

, , +14

Enhancing composition control of alloy nanoparticles from gas aggregation source by in operando optical emission spectroscopy

Jonas Drewes, Alexander Vahl, Niko Carstens et al. · Plasma Processes and Polymers · 2020 · 28 citations · Full text

, , +17