Publication | Closed Access
Effect of different pulse modes during Cl2/Ar inductively coupled plasma etching on the characteristics of nanoscale silicon trench formation
22
Citations
43
References
2022
Year
Electrical EngineeringEngineeringMicrofabricationNanoelectronicsSurface ScienceApplied PhysicsSemiconductor Device FabricationDifferent Pulse ModesMicroelectronicsPlasma EtchingPlasma ProcessingSilicon On Insulator
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