ACS Applied Materials & Interfaces · 2021 · 35 citations · 44 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsChemical Vapor DepositionCrystal GrowthNanoelectronicsSemiconductor Crystal GrowthSemiconductor PhysicsTwo-dimensional SemiconductorsAtomically Thin SemiconductorsCarrier MobilityCharge Carrier MobilityGas FlowSaturation CurrentSub-threshold Operation
2D semiconductors with atomically thin body thickness have attracted tremendous research interest for high-performance nanoelectronics and optoelectronics. Most of the 2D semiconductors grown by chemical vapor deposition (CVD) methods suffer from rather low carrier mobility, small single-crystal size, and instability under ambient conditions. Here, we develop an improved CVD method with controllable reverse-gas flow to realize the direct growth of quality Bi2O2Se 2D single crystals on a mica substrate. The applied reverse flow significantly suppresses the random nucleation and thus promotes the lateral size of 2D Bi2O2Se crystals up to ∼750 μm. The Bi2O2Se field-effect transistors display high-room-temperature electron mobility up to ∼1400 cm2·V–1·s–1 and a well-defined drain current saturation. The on/off ratio of the Bi2O2Se transistor is larger than 107, and the sub-threshold swing is about 90 mV·dec–1. The responsivity, response time, and detectivity of Bi2O2Se photodetectors approach up to 60 A·W–1, 5 ms, and 2.4 × 1010 Jones at room temperature, respectively. Our results demonstrate large-size and high-quality Bi2O2Se grown by reverse-flow CVD as a high-performance channel material for next-generation transistors and photodetectors.
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