Atomic layer deposition of LiF using LiN(SiMe<sub>3</sub>)<sub>2</sub> and SF<sub>6</sub> plasma

N. Hornsveld, W. M. M. Kessels, R. A. Synowicki, Mariadriana Creatore

Physical Chemistry Chemical Physics · 2021 · 14 citations · 44 references

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Abstract

Lithium fluoride films were prepared by atomic layer deposition (ALD) using a new route in which LiN(SiMe<sub>3</sub>)<sub>2</sub> is used as a precursor and SF<sub>6</sub> plasma as a coreactant. It was demonstrated that SF<sub>6</sub> plasma is a promising coreactant for ALD of high purity lithium fluoride films.

References

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