Study of selective isotropic etching Si1−xGex in process of nanowire transistors - Concepedia

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Study of selective isotropic etching Si1−xGex in process of nanowire transistors

DOI Full Paper Access

29

Citations

30

References

2019

Year

Junjie Li, Yongliang Li, N. Zhou, Guilei Wang, Zhenzhen Kong, Jianyu Fu, Xiaogen Yin, Chen Li, Xiaolei Wang, Hong Yang,

Journal of Materials Science Materials in Electronics

Materials ScienceNanowire TransistorsElectrical EngineeringEngineeringMicrofabricationNanotechnologyNanoelectronicsApplied PhysicsSelective IsotropicSemiconductor Device FabricationSilicon On InsulatorPlasma EtchingNanolithography MethodSemiconductor Device

References

	Year	Citations

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