<i>In situ</i> femtosecond pulse laser ablation for large volume 3D analysis in scanning electron microscope systems

Abstract

The authors have developed a system combining a 220 fs pulse focused laser beam operating at 1030 or 515 nm, a Xe+ plasma source focused ion beam, and a Schottky source focused electron beam, all coincident at the sample. They present on results and applications for in situ micro device characterization and large volume 3D analysis.