Publication | Closed Access

IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM

Materials SciencePhotonicsPhotonic DeviceOptical MaterialsEngineeringBeam LithographyElectron-beam LithographyOptical PropertiesSurface ScienceApplied PhysicsPhotonic MaterialsPhotonic ApplicationsLaser-surface InteractionsLaser LithographyOptoelectronicsNanolithography MethodIp-dip Photoresist Surfaces