Large-scale high-numerical-aperture super-oscillatory lens fabricated by direct laser writing lithography

Abstract

= 633 nm, thus giving an effective numerical aperture as high as 1.19 in air. As a complementary sub-micrometer fabrication method between traditional lithography and nanofabrication method, DLW is proved to be a promising approach to manufacture SOLs, presenting advantages of relatively high speed, low equipment volume, less complexity and sub-micrometer lateral resolution. Such SOLs can be very useful in high resolution bio-imaging on rough surfaces and in the related research fields.