Damage-free highly efficient polishing of single-crystal diamond wafer by plasma-assisted polishing

Surface OH group governing adsorption properties of metal oxide films

Satoshi Takeda, Makoto Fukawa, Yasuo Hayashi et al. · Thin Solid Films · 1999 · 267 citations

Natural Sciences, Chemistry, Materials Science +14

Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface

Kazuya Yamamura, Tatsuya Takiguchi, Masaki Ueda et al. · CIRP Annals · 2011 · 213 citations

Engineering, Materials Engineering, Materials Science +13

Indentation Behavior of Soda‐Lime Silica Glass, Fused Silica, and Single‐Crystal Quartz at Liquid Nitrogen Temperature

Charles R. Kurkjian, G. W. Kammlott, M. Munawar Chaudhri · Journal of the American Ceramic Society · 1995 · 133 citations

Natural Sciences, Materials Engineering, Materials Science +14

Ultraviolet-irradiated precision polishing of diamond and its related materials

Junji Watanabe, Mutsumi Touge, Takeshi Sakamoto · Diamond and Related Materials · 2013 · 95 citations

Natural Sciences, Materials Engineering, Materials Science +7

Atomic-scale flattening mechanism of 4H-SiC (0 0 0 1) in plasma assisted polishing

Hui Deng, Kazuya Yamamura · CIRP Annals · 2013 · 93 citations

Engineering, Materials Engineering, Materials Science +9