Investigation of 20% scandium-doped aluminum nitride films for MEMS laterally vibrating resonators

Abstract

This paper reports on the investigation of 1 μm thick films of 20% Scandium-doped Aluminum Nitride (ScAlN) for the making of piezoelectric MEMS laterally vibrating resonators (LVRs). The ScAlN films, which can be sputter-deposited such as undoped Aluminum Nitride (AlN) films, were used to demonstrate high performance resonators. These devices showed quality factor (Q <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> ) in excess of 1000 in air centered around 250 and 500 MHz and enhanced electromechanical coupling (k <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub> <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ) in the range of 3.2-4.5%. This k <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub> <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> is double the value of what has been achieved on similar resonators made out of AlN films. A 3-dB Q <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> of 1300 has been recorded both for 1-port and 2-port resonators at 250 and 500 MHz, while a maximum Q <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> of 1500 has been recorded for a 1-port resonator at 500 MHz. Along with experimental results from actual devices, this work also reports the etching characteristics of the piezoelectric material under Cl <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /BCl <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> chemistry to attain high selectivity and straight sidewall with a SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> hard mask. More broadly, enhancement of resonators design and fabrication process, suppression of spurious modes and increase in the concentration of Sc (theoretically up to 40%) will lead to significant performance improvements for many classes of piezoelectric MEMS, especially tunable filters.