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Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM

DOIFull Paper Access

20

Citations

19

References

2017

Year

Philippe Rodriguez, R. Famulok, Y. Le Friec, J.-P. Reynard, Benoit-Noel Bozon, F. Boyer, Karen Dabertrand, C. Jahan, S. Favier, Yann Mazel,
Materials Science in Semiconductor Processing

References

YearCitations

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