X‐ray Laue Diffraction Microscopy in 3D at the Advanced Photon Source

Abstract

Studies of materials on mesoscopic length‐scales require a penetrating structural probe with submicron point‐to‐point spatial resolution. The principle research activities at beamline 34‐ID‐E of the Advanced Photon Source (APS) involve development of exciting new micro‐/nano‐diffraction techniques for characterization and microscopy in support of both applied engineering and fundamental materials research. Taking advantage of the high brightness of the source, advanced focusing mirrors, a novel depth profiling technique, and high‐speed area detectors, three‐dimensional scanning Laue diffraction microscopy provides detailed local structural information of crystalline materials, such as crystallographic orientation, orientation gradients, and strain tensors. It is general and applicable to single‐crystal, polycrystalline, composite, deformed, and functionally graded materials. Applications include 3D diffraction investigations for a diverse and growing user community with interests in materials deformation, electro‐migration, recrystallization, fatigue, solid‐solution precipitation, high‐pressure environments, and condensed matter physics.