HfO/sub 2/ and HfAlO for CMOS: thermal stability and current transport

Wenjuan Zhu, T.P. Ma, T. Tamagawa, Yunxiang Di, Jin‐Hwan Kim, R. Carruthers, M. Gibson, T. Furukawa

2002 · 60 citations · 7 references

Concepts

Abstract

This paper reports the thermal stability of HfO/sub 2/ with/without Al inclusion (based on XRD and leakage current data), and energy band diagrams for metal/HfO/sub 2//Si structures as well as associated current transport mechanisms (based on gate current characteristics at various temperatures).

References

7