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Technology trends of silicon-on-insulator-its advantages and problems to be solved

47

Citations

1

References

2002

Year

Abstract

Recent progress in SOI technology is reviewed and problems which need be solved are discussed. Emphasis is placed on the substrate floating effect, for which the bandgap engineering method is proposed for the first time. It is demonstrated that Si-Ge formation in the source region can improve the drain breakdown voltage significantly.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

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