Publication | Open Access
Editors' Choice Communication—A (001) β-Ga<sub>2</sub>O<sub>3</sub>MOSFET with +2.9 V Threshold Voltage and HfO<sub>2</sub>Gate Dielectric
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Citations
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References
2016
Year
Oxide HeterostructuresMaterials ScienceElectrical EngineeringSemiconductorsEngineeringMos TransistorWide-bandgap SemiconductorSemiconductor TechnologyElectron ConductivityElectronic EngineeringOxide SemiconductorsApplied PhysicsOxide ElectronicsGallium OxideChoice Communication—aMicroelectronicsHall EffectSemiconductor Device
An MOS transistor fabricated on (001) β-Ga2O3 exfoliated from a commercial (−201) β-Ga2O3 substrate is reported. A maximum drain current of 11.1 mA/mm was measured, and a non-destructive breakdown was reached around 80 V in the off state. Threshold voltage of +2.9 V was extracted at 0.1 V drain bias, and peak transconductance of 0.18 mS/mm was measured at VDS = 1 V, corresponding to a field effect mobility of 0.17 cm2/Vs. Hall effect and electron spin resonance data suggested that electron conductivity was due primarily to O vacancy donors (VO+) with an estimated density of 2.3 × 1017 (±50%) cm−3.
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