Multibeam X-ray lithography to form deep regular microstructures

B. G. Goldenberg, A. G. Lemzyakov, A.G. Zelinsky, V. Nazmov, V. F. Pindyurin

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques · 2016 · 12 citations · 3 references

Concepts

Abstract

A method for the fabrication of regular microstructures with a high aspect ratio (for example, X-ray gratings) by direct multibeam vector recording in layers of an SU-8 resist is presented. An X-ray beam with a wavelength from 0.4 to 1.7 Å is used for recording. The features of the method are described. The fabricated samples of regular microstructures of the SU-8 resist and gold-plated X-ray masks are presented as finished products.

References

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