Publication | Closed Access
Nanocontact Electrification through Forced Delamination of Dielectric Interfaces
37
Citations
22
References
2010
Year
DielectricsEngineeringNanocontact ElectrificationCharge-patterned SurfacesConformal Material InterfacesNanoelectronicsPrinted ElectronicsNanolithographyNanometrologyNanolithography MethodMaterials ScienceElectrical EngineeringElectromigration TechniqueNanotechnologyTime-dependent Dielectric BreakdownElectrical InsulationElectrical PropertyMicrofabricationNanomaterialsSurface ScienceApplied PhysicsForced Delamination
This article reports patterned transfer of charge between conformal material interfaces through a concept referred to as nanocontact electrification. Nanocontacts of different size and shape are formed between surface-functionalized polydimethylsiloxane (PDMS) stamps and other dielectric materials (PMMA, SiO(2)). Forced delamination and cleavage of the interface yields a well-defined charge pattern with a minimal feature size of 100 nm. The process produces charged surfaces and associated fields that exceed the breakdown strength of air, leading to strong long-range adhesive forces and force-distance curves, which are recorded over macroscopic distances. The process is applied to fabricate charge-patterned surfaces for nanoxerography demonstrating 200 nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors.
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