Publication | Closed Access
Strain Imaging of Nanoscale Semiconductor Heterostructures with X-Ray Bragg Projection Ptychography
64
Citations
32
References
2014
Year
Materials ScienceEngineeringPhysicsMicroscopyLattice RotationLattice StrainStrain LocalizationApplied PhysicsStrain ImagingScanning Probe MicroscopyComplementary ComponentsMultilayer HeterostructuresMolecular Beam EpitaxyNanoscale ScienceEpitaxial GrowthNanoscale SemiconductorHigh Strain Rate
We report the imaging of nanoscale distributions of lattice strain and rotation in complementary components of lithographically engineered epitaxial thin film semiconductor heterostructures using synchrotron x-ray Bragg projection ptychography (BPP). We introduce a new analysis method that enables lattice rotation and out-of-plane strain to be determined independently from a single BPP phase reconstruction, and we apply it to two laterally adjacent, multiaxially stressed materials in a prototype channel device. These results quantitatively agree with mechanical modeling and demonstrate the ability of BPP to map out-of-plane lattice dilatation, a parameter critical to the performance of electronic materials.
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