Large Area Flexible Electronics Fabricated Using Self-Aligned Imprint Lithography

Abstract

This paper presents Self-Aligned Imprint Lithography (SAIL), a technology for producing submicron layer-to-layer alignments on large, dimensionally variable flexible plastic structures. The roll-to-roll compatible process is used to make 1 μm channel length transistors and active matrix arrays using a-Si and zinc-tin-oxide (ZTO) with electrical characteristics that nearly match those obtained using photolithography. The remaining issues for commercialization are discussed