Thermal Stability of a-C:F,H Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition - Concepedia

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Thermal Stability of a-C:F,H Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

17

Citations

10

References

1997

Year

Jeremy Theil, Francoise Mertz, M.B. Yairi, K. L. Seaward, G.W. Ray, G. Kooi

MRS Proceedings

Materials ScienceEngineeringApplied PhysicsH Films DepositedChemical Vapor DepositionThin FilmsChemical DepositionThermal StabilityPlasma ProcessingThin Film Processing

References

	Year	Citations

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