Publication | Closed Access
Redistribution Layers (RDLs) for 2.5D/3D IC Integration
32
Citations
6
References
2013
Year
EngineeringDevice IntegrationComputer ArchitectureRedistribution LayersInterconnect (Integrated Circuits)Wafer Scale ProcessingAdvanced Packaging (Semiconductors)Ic IntegrationRedistribution LayerElectronic PackagingCu Damascene MethodMaterials EngineeringMaterials ScienceElectrical Engineering3D Ic ArchitectureComputer EngineeringChip AttachmentMicroelectronicsSurface ScienceApplied PhysicsThree-dimensional Integrated Circuits3D Integration
Redistribution layer (RDL) is an integral part of 3D IC integration, especially for 2.5D IC integration with a passive interposer. The RDL allows for fans out of the circuitries and allows the lateral communication between the chips attached to the interposer. There are at least two ways to fabricate the RDL, namely (a) polymers to make the passivation and Cu-plating to make the metal layer, and (b) semiconductor back-end-of-line Cu damascene. In this study, the materials and processes of these methods are presented. Emphasis is placed on the Cu damascene method.
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