IEEE Electron Device Letters · 2009 · 99 citations · 11 references
EngineeringMaterials EngineeringMaterials ScienceSemiconductor DevicesSemiconductor MaterialsThin FilmsPhotovoltaic DevicesPhotovoltaic MaterialsSemiconductor Device MaterialsSemiconductor Thin FilmsSolar Cell MaterialsSolar CellsCurrent DensityEnergy Conversion EfficiencyGallium Nitride (Gan) MaterialsLight AbsorptionLight Absorption EnhancementPhotocurrent GenerationSolar Cell FabricationThin-film Solar Cells
In this letter, we report on the fabrication and photovoltaic characteristics of p-i-n GaN/InGaN thin-film solar cells. The thin-film solar cells were fabricated by removing sapphire using a laser lift-off technique and, then, transferring the remaining p-i-n structure onto a Ti/Ag mirror-coated Si substrate via wafer bonding. The mirror structure is helpful to enhance light absorption for a solar cell with a thin absorption layer. After the thin-film process for a conventional sapphire-based p-i-n solar cell, the device exhibits an enhancement factor of 57.6% in current density and an increment in conversion efficiency from 0.55% to 0.80%. The physical origin for the photocurrent enhancement in the thin-film solar cell is related to multireflection of light by the mirror structure.
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Unusual properties of the fundamental band gap of InN
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Design and characterization of GaN∕InGaN solar cells
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InGaN/GaN multiple quantum well solar cells with long operating wavelengths
R. Dahal, B. N. Pantha, J. Li et al. · Applied Physics Letters · 2009 · 357 citations · Full text