Measurements and modeling of intrinsic fluctuations in MOSFET threshold voltage

Abstract

Fluctuations in intrinsic linear Vt, free of impact of parasitics, are measured for large arrays of NMOS and PMOS devices on a testchip in a 150nm logic technology. Local intrinsic σVT, free of extrinsic process, length and width variations, is random, and worsens with reverse body bias. Although the traditional area-dependent component is dominant, a significant component of the fluctuations in small devices depends only on device width or length.