Highly Transparent and Conductive ZnO: Al Thin Films from a Low Temperature Aqueous Solution Approach

Abstract

A solution deposition approach for high-performance aluminum-doped zinc oxide (AZO) thin films (visible transparency > 90% and sheet resistance down to 25 Ω/sq) with process temperatures not exceeding 85 °C is presented. This allows the non-vacuum deposition of AZO on temperature sensitive substrates such as polymer films for flexible and transparent electronics, or inorganic and organic thin film photovoltaics. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.