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AlGaN/GaN Recessed MIS-Gate HFET With High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications
387
Citations
23
References
2008
Year
Wide-bandgap SemiconductorElectrical EngineeringEngineeringPower Electronics ApplicationsHigh Threshold VoltageApplied PhysicsThreshold VoltageAluminum Gallium NitridePower Semiconductor DeviceGan Power DeviceMis-gate HfetPower ElectronicsHigh-threshold-voltage Normally-off OperationNormally-off Operation
This letter reports normally-off operation of an AlGaN/GaN recessed MIS-gate heterostructure field-effect transistor with a high threshold voltage. The GaN-based recessed MIS-gate structure in conjunction with negative polarization charges under the gate allows us to achieve the high threshold voltage, whereas the low on-state resistance is maintained by the 2-D electron gas remaining in the channel except for the recessed MIS-gate region. The fabricated device exhibits a threshold voltage as high as 5.2 V with a maximum field-effect mobility of 120 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vmiddots, a maximum drain current of over 200 mA/mm, and a breakdown voltage of 400 V.
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