IEEE Transactions on Electron Devices · 1990 · 92 citations · 11 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor DevicesDopingHigh-frequency Semiconductor DevicesMicrowave Semiconductor DevicesSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsCurrent CollapseCutoff FrequencyDoped SemiconductorsHigh-frequency ElectronicsMetalorganic Chemical Vapor DepositionThreshold VoltageTrapping EffectsTraps
The DC and microwave characteristics of Ga/sub 0.51/In/sub 0.49/P/GaAs HEMTs grown by metalorganic chemical vapor deposition (MOCVD) are presented. Devices with 1- mu m-long gates show transconductances of 163 and 213 mS/mm at 300 and 77 K, respectively. Their maximum cutoff frequency is 17.8 GHz. Deep traps in the doped layer are evaluated at low temperature by the threshold voltage shift and current collapse phenomena. GaInP/GaAs HEMTs show no current collapse and have almost zero threshold voltage shift compared to AlGaAs/GaAs and InAlAs/InGaAs where the corresponding values are 0.5 and 0.25 V, respectively.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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Masayuki Ishikawa, Yasuo Ohba, Hideto Sugawara et al. · Applied Physics Letters · 1986 · 192 citations
Takashi Kobayashi, K. Taira, Fumihiko Nakamura et al. · Journal of Applied Physics · 1989 · 166 citations